Layer-by-Layer Assembly of Thick, Cu2+-Chelating Films
نویسندگان
چکیده
منابع مشابه
Sculptured Layer-by-Layer Films
The precise assembly of nanostructured materials into two (2D) and three-dimensional (3D) periodic microscopic arrays is achieved by employing various assembling technologies such as microparticle self-organization, photolithography, holographic lithography, selective chemical etching, ink printing, laser-based polymerization, selective responsive grafting, and inversion of bilayers. Soft litho...
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Multilayer films with up to 600 bilayers and 740 nm thickness were fabricated using the alternating deposition of poly allylamine hydrochloride and poly 1p3 -carboxy-4 hydroxyphenylazo benzenesulfonamido -1,2-ethandiyl on glass substrates. Linear relationships for absorbance, thickness, and the square root of the second harmonic intensity versus the number of bilayers demonstrates that the film...
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Layer-by-layer (LBL) assembly is one of the most ubiquitous coating techniques today. It also offers a pathway for multifunctional/multicomponent materials with molecular-scale control of stratified structures. However, technological applications of LBL are impeded by laborious and fluid-demanding nature of the process. While vertical organization of LBL films is natural for this technique, the...
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Multilayered thin films prepared with the layer-by-layer (LBL) assembly technique are typically "brittle" composites, while many applications such as flexible electronics or biomedical devices would greatly benefit from ductile, and tough nanostructured coatings. Here we present the preparation of highly ductile multilayered films via LBL assembly of oppositely charged polyurethanes. Free-stand...
متن کاملModulating the pattern quality of micropatterned multilayer films prepared by layer-by-layer self-assembly.
Patterned multilayer films composed of poly(allylamine hydrochloride) (PAH) and poly(sodium 4-styrenesulfonate) (PSS) were prepared using dip and spin self-assembly (SA) methods. A silicon substrate was patterned with a photoresist thin film using conventional photolithography, and PAH/PSS multilayers were then deposited onto the substrate surface using dip or spin SA. For spin SA, the photores...
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ژورنال
عنوان ژورنال: Langmuir
سال: 2013
ISSN: 0743-7463,1520-5827
DOI: 10.1021/la402633x